It maintains a long working distance even at high magnification (3.1mm, far exceeding that of conventional 100× objectives), balancing high resolution with operational safety; a numerical aperture (NA) of 0.8 enhances light-gathering capability, and combined with a flat-field semi-apochromatic design, it achieves high-definition, color-fringe-free imaging across the entire field of view.

Applications include:
Ultra-fine inspection of semiconductor nano-defects (such as pinholes in wafer oxide layers), micro-morphologies of ultra-precision materials (such as graphene), etc.