High NA + apochromatic correction enables fine ultraviolet-visible imaging, and flat-field design eliminates high-magnification edge blurring, making it suitable for research-grade analysis.

Applications include:
Liquid crystal micron-level defect analysis (such as 0.5μm scratches, bubbles);
Near-ultraviolet photoresist observation of semiconductor wafers (optimized for 355nm wavelength, compatible with lithography processes).