Medium magnification balances range and detail. The NA improvement enables a resolution of 2μm (2.5 times higher than that of 2×), and the flat-field design ensures consistent clarity between the edge and center of the field of view.

Applications include:
Observation of metal grain distribution and semiconductor packaging textures. The long working distance is suitable for samples with convex structures (such as welded parts and chip pins). A polarizing module can be added to analyze crystal orientation.