| Quantity | Price(USD) | Ship Date |
|---|---|---|
| 1-10 | TBD | |
| 10- | TBD |
NOTE : Ship Dates above are subject to change depending upon availability.

High NA + apochromatic correction enables fine ultraviolet-visible imaging, and flat-field design eliminates high-magnification edge blurring, making it suitable for research-grade analysis.
Applications include:
Liquid crystal micron-level defect analysis (such as 0.5μm scratches, bubbles);
Near-ultraviolet photoresist observation of semiconductor wafers (optimized for 355nm wavelength, compatible with lithography processes).
| NA | 0.45 | WD | 15mm |
| ±D.F | 1.4um | Φ24 Eyepiece Field of View | 0.48mm |
| Quantity | Price(USD) | Ship Date |
|---|---|---|
| 1-10 | TBD | |
| 10- | TBD |