VL Plan Apo HR Brightfield Observation Objective Lens

After the numerical aperture (NA) exceeds 0.42, the resolution reaches the sub-micron level (0.7μm). With a 15mm working distance (WD),

it still supports limited operations (e.g., auxiliary micro-operation), making it a universal high-resolution model for industrial quality inspection and scientific research.

It can be applied to:

• The detection of shallow surface defects (scratches, particles, photoresist defects) on semiconductor wafers;
• The observation of cell-level structures in biological samples (e.g., microtubules in tissue sections, plant stomata).