Ultra-long and wide field of view: 2× low magnification + 30.5mm ultra-long working distance. When matched with a Φ24 eyepiece, the actual field of view reaches 12mm, which can cover large-sized samples at one time (such as the edge of an entire wafer), reducing stitching observation errors. Apochromatic adaptation: Synchronous correction for 355nm ultraviolet and 532nm visible light, suitable for rapid dual-band scanning (ultraviolet-visible) of large-scale samples (such as initial positioning of semiconductor wafers, global inspection of LCD panels).

Applications:
"Rapid screening" of large-sized samples in industrial production lines, or area positioning before laser processing.