"Ultra-long distance + high resolution" breakthrough: maintaining a working distance of 30.5mm at 10× magnification (far exceeding the 10-15mm of conventional 10× objectives), while the NA is increased to 0.28 and the resolution reaches 1μm, meeting the dual requirements of "long operating space + precise observation". Parfocal advantage: a 95mm conjugate distance ensures that the focus remains unchanged when switching with 2×/5× objectives, improving the efficiency of multi-magnification observation.

Applications:
Inspection of samples with complex fixtures (such as flip chips), observation of laser etching requiring manual operation space.