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VL Plan Apo NUV/M Plan Apo NUV HR Near-Ultraviolet Field Objectives

Part Number: VL Plan Apo NUV 5X

"Long-distance + medium magnification" balance: The combination of a 30.5mm working distance and 5× magnification not only retains a large operating space (suitable for fixtures and light sources) but also improves the resolution to 2.1μm, enabling observation of medium-level details (such as LCD pixel arrays and chip packaging contours). Multi-band compatibility: Achromatic aberration correction in the 355-532nm range, supporting simultaneous ultraviolet laser processing and visible light observation (e.g., real-time monitoring of laser cutting areas).


Applications:
Defect detection in electronic component packaging, "regional-level" detail observation in laser micromachining.

Caution
  • Product image is for representative purposes only and not reflective of every product available on this page.

Configured Specifications

NA0.13WD30.5mm
±D.F16.3umΦ24 Eyepiece Field of View4.8mm
Unit Price
Total
Ship Date
TBD
Qty.
Quantity Price(USD)Ship Date
1-10TBD
10-TBD
NOTE : Ship Dates above are subject to change depending upon availability.

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