M Plan Apo SL Series Objectives

100× "User-Friendly Extreme Lens": A 13mm working distance allows fine focusing on ultra-thin samples (≤5μm), avoiding the "blur on contact" issue of conventional high-power lenses; NA=0.55 + apochromatic correction, achieving both excellent color and clarity at high magnification, breaking through the bottleneck in observing submicron structures (such as viral morphology, nanoparticles);

Applications:

Analysis of stained viral envelope structures, measurement of semiconductor gate linewidths (≤0.5μm), ultra-fine observation of kaolinite lamellae.