Objectives

The core optical component for professional-grade brightfield imaging

• Ultra-long working distance design
• Apochromatic and flat-field correction
• High numerical aperture and high resolution
• Anti-reflective coating and broad spectral compatibility

High-order brightfield imaging + quantitative analysis

• Super Apochromatic Global Correction
• Synergy of High NA and Ultra-Long Working Distance
• Multi-Band High-Contrast Imaging
• Extreme Environment Adaptability Design

M Plan Apo SL is the "high-end configuration" in brightfield observation, widely used in industrial inspection, materials science, and quality control.

• Apochromatic (Apo): Precise correction of multiple wavelengths, achieving "zero deviation" in color
• Planar design (Plan): Clear viewing "from start to finish" across the entire field of view with a single lens
• Super-long working distance (SL): "Adequate space" for samples, enabling safer operation
• Optimized exclusive optical path for brightfield: Enhances "light-dark contrast" to make details more prominent
• Infinity correction system: Flexible optical path with strong expandability
• Visible light band adaptation (VL): Covers regular observation needs

Synergistic Innovation in Photopic and Near-Infrared Processing, widely used in scientific research, industrial inspection, and equipment integration.

• Ultra-long working distance ensures processing safety
• Near-infrared apochromatic high-definition imaging
• Sub-micron resolution for HR series
• Seamless collaboration between photopic and processing dual scenarios
• High stability to meet mass production needs

It is a high-end near-infrared objective exclusively for the liquid crystal industry.

• Optical correction: flat field + apochromatic, achieving "full-field precise imaging"
• Near-infrared exclusive: penetrating glass + compatible with laser processing
• Customized glass compensation: adapting to liquid crystal substrates of different thicknesses
• Long working distance + infinite correction: safer and more flexible operation
• Bright field optimization: sharp contrast, details "distinguishable at a glance"

A high-end optical device designed for the manufacturing and repair of liquid crystal panels.

• UV apochromatic correction and high damage threshold
• Dynamic compensation for glass thickness and long working distance
• Coaxial optical path real-time closed-loop control
  
  
  

Infinity-Corrected Brightfield Flat-Field Apochromatic Objectives

• Full-band apochromatic correction: precise focusing from near-ultraviolet to visible light
• High numerical aperture of the HR version breaks through the resolution limit
• Design with long working distance and compatibility with laser processing
• Flat-field apochromatic design ensures clarity across the entire field of view
• Infinity correction and flexibility in system integration
• Environmentally friendly materials and adaptation to special scenarios

Widely used in metallographic defect detection, semiconductor chip observation, and material microscopic analysis

• Flat-field apochromatic: "No chromatic aberration, no blurring" across the entire field of view
• Long working distance: Suitable for thick/bulging samples
• Infinite optical path: Strong expandability
• Exclusive for metallography: Adaptable without a cover glass

Widely used in metal grain analysis, chip defect detection, and coating observation

• Semi-apochromatic: Fluoride enables precise color rendering
• Flat field design: Clear view across the entire field without blind spots
• Episcopic EPI illumination: Customized for opaque samples
• Infinite conjugate parfocality: Significantly improves efficiency when changing magnifications
• Long working distance (for some models): Compatible with thick / raised samples

Widely used in metal material processing and quality inspection, semiconductor and electronic component quality inspection

• Brightfield and darkfield dual mode (BD): One-click switching, doubling efficiency
• Flat field semi-apochromatic (Plan + Fluor): Clear full field of view, no color deviation
• 45mm infinite conjugate parfocality: No need to refocus when changing magnifications, strong expandability
• Full magnification coverage: From macro to nanoscale, no dead angles in scenes

Widely used in the semiconductor field, automobile manufacturing, precision machinery, and other fields

• Long working distance breaks through industry limits
• Optical revolution of flat-field semi-apochromatic
• Industrial-grade durability and compatibility
• Balancing the contradiction between resolution and working distance
• Targeted optimization of episcopic illumination
• Precise adaptation to industrial inspection scenarios

Widely used in fields such as metal processing, semiconductor quality inspection, and precision molds

• Long working distance breaks industry limits
• One-click switching between bright and dark field modes
• Optical revolution of flat field semi-apochromatic
• 45mm infinite conjugate parfocal architecture
• High resolution and imaging contrast

Widely used in semiconductor manufacturing and quality inspection, electronic component and MEMS testing, metal material analysis, precision molds and mechanical parts

• Apochromatic correction
• Flat field design
• 95mm infinite conjugate parfocal architecture
• High resolution and long working distance
• EPI episcopic bright field optimization

Widely used in fields such as semiconductors (wafer defects / film thickness), optical components (surface flatness), precision manufacturing (part roughness)

• Nanoscale non-contact precision
• Serial scene adaptation
• Industry universal benchmark

Widely used in fields such as biological sciences (cell/tissue imaging), materials science (metal grain boundary/semiconductor defect detection)

• Flat field correction across the entire field of view, eliminating edge blurring
• Multimodal compatibility, with brightfield as the basis to expand analysis dimensions
• High-precision aberration correction and optimization of optical performance
• Serialized design, covering all scenario requirements
  

Widely used in dynamic fluorescence imaging of living cells, multicolor fluorescence diagnosis of pathological sections, deep imaging of 3D biological structures

• Semi-apochromatic correction, balancing resolution and color reproduction
• Wide-spectrum and high light transmittance, suitable for multiple fluorescent dyes
• Multimodal seamless switching, optimizing experimental procedures
• Balanced NA and working distance, suitable for complex biological samples
• Full-field flat-field imaging, ensuring the reliability of quantitative analysis

Widely used in multimodal dynamic research of living cells, cell function and toxicity analysis, fine observation of transparent/thin samples, imaging of samples in plastic containers

• Multimodal integration, reducing photobleaching
• High quality and efficiency in fluorescent imaging
• Outstanding details in phase contrast observation
• Wide sample compatibility

Widely used in basic life science research, medical research and drug development, cutting-edge technologies and interdisciplinary applications

• Extreme chromatic aberration correction (apochromatic)
• High flatness across the entire field of view (flat-field design)
• Infinite correction optical system
• Balance between high NA and working distance
• Compatibility with multimodal and cutting-edge technologies