Objectives
The objective lens of VenusLab microscope is the core imaging component of an optical microscope. It is responsible for collecting the reflected/transmitted light from microscopic samples and converging it to form an image. Working in synergy with the microscope camera, it enables "high-magnification and high-definition microscopic observation".Different from other optical components, it directly determines the imaging resolution and clarity, and serves as a key element in microscopic analysis for biology, materials science, and industrial applications.
M Plan Apo Series Objectives
The core optical component for professional-grade brightfield imagingUltra-long working distance designApochromatic and flat-field correctionHigh numerical aperture and high resolutionAnti-reflective coating and broad spectral compatibility
M Plan Apo HR Series Objectives
High-order brightfield imaging + quantitative analysisSuper Apochromatic Global CorrectionSynergy of High NA and Ultra-Long Working DistanceMulti-Band High-Contrast ImagingExtreme Environment Adaptability Design
M Plan Apo SL Series Objectives
M Plan Apo SL is the "high-end configuration" in brightfield observation, widely used in industrial inspection, materials science, and quality control.Apochromatic (Apo): Precise correction of multiple wavelengths, achieving "zero deviation" in colorPlanar design (Plan): Clear viewing "from start to finish" across the entire field of view with a single lensSuper-long working distance (SL): "Adequate space" for samples, enabling safer operationOptimized exclusive optical path for brightfield: Enhances "light-dark contrast" to make details more prominent Infinity correction system: Flexible optical path with strong expandabilityVisible light band adaptation (VL): Covers regular observation needs
M Plan Apo NIR/M Plan Apo NIR HR Series Objectives
Synergistic Innovation in Photopic and Near-Infrared Processing, widely used in scientific research, industrial inspection, and equipment integration.Ultra-long working distance ensures processing safetyNear-infrared apochromatic high-definition imagingSub-micron resolution for HR seriesSeamless collaboration between photopic and processing dual scenariosHigh stability to meet mass production needs
LCD Plan Apo NIR Series Objectives
It is a high-end near-infrared objective exclusively for the liquid crystal industry. • Optical correction: flat field + apochromatic, achieving "full-field precise imaging"• Near-infrared exclusive: penetrating glass + compatible with laser processing• Customized glass compensation: adapting to liquid crystal substrates of different thicknesses• Long working distance + infinite correction: safer and more flexible operation• Bright field optimization: sharp contrast, details "distinguishable at a glance"
LCD Plan Apo NUV Series Objectives
A high-end optical device designed for the manufacturing and repair of liquid crystal panels.UV apochromatic correction and high damage thresholdDynamic compensation for glass thickness and long working distanceCoaxial optical path real-time closed-loop control
M Plan Apo NUV/ M Plan Apo NUV HR Series Objectives
Infinity-Corrected Brightfield Flat-Field Apochromatic Objectives• Full-band apochromatic correction: precise focusing from near-ultraviolet to visible light• High numerical aperture of the HR version breaks through the resolution limit• Design with long working distance and compatibility with laser processing• Flat-field apochromatic design ensures clarity across the entire field of view• Infinity correction and flexibility in system integration• Environmentally friendly materials and adaptation to special scenarios
M Plan Apo FN40 Series Objectives
Widely used in metallographic defect detection, semiconductor chip observation, and material microscopic analysisFlat-field apochromatic: "No chromatic aberration, no blurring" across the entire field of viewLong working distance: Suitable for thick/bulging samplesInfinite optical path: Strong expandabilityExclusive for metallography: Adaptable without a cover glass
Plan Fluor EPI Series Objectives
Widely used in metal grain analysis, chip defect detection, and coating observation• Semi-apochromatic: Fluoride enables precise color rendering• Flat field design: Clear view across the entire field without blind spots• Episcopic EPI illumination: Customized for opaque samples• Infinite conjugate parfocality: Significantly improves efficiency when changing magnifications• Long working distance (for some models): Compatible with thick / raised samples
Plan Fluor EPI BD Series Objectives
Widely used in metal material processing and quality inspection, semiconductor and electronic component quality inspectionBrightfield and darkfield dual mode (BD): One-click switching, doubling efficiencyFlat field semi-apochromatic (Plan + Fluor): Clear full field of view, no color deviation45mm infinite conjugate parfocality: No need to refocus when changing magnifications, strong expandabilityFull magnification coverage: From macro to nanoscale, no dead angles in scenes
L Plan Fluor EPI Series Objectives
Widely used in the semiconductor field, automobile manufacturing, precision machinery, and other fieldsLong working distance breaks through industry limitsOptical revolution of flat-field semi-apochromaticIndustrial-grade durability and compatibilityBalancing the contradiction between resolution and working distanceTargeted optimization of episcopic illuminationPrecise adaptation to industrial inspection scenarios
L Plan Fluor EPI BD Series Objectives
Widely used in fields such as metal processing, semiconductor quality inspection, and precision moldsLong working distance breaks industry limitsOne-click switching between bright and dark field modesOptical revolution of flat field semi-apochromatic45mm infinite conjugate parfocal architectureHigh resolution and imaging contrast
Plan Apo EPI Series Objectives
Widely used in semiconductor manufacturing and quality inspection, electronic component and MEMS testing, metal material analysis, precision molds and mechanical partsApochromatic correctionFlat field design95mm infinite conjugate parfocal architectureHigh resolution and long working distanceEPI episcopic bright field optimization
CF Plan TI/DI Series Objectives
Widely used in fields such as semiconductors (wafer defects / film thickness), optical components (surface flatness), precision manufacturing (part roughness)• Nanoscale non-contact precision• Serial scene adaptation• Industry universal benchmark
CF Plan Series Objectives
Widely used in fields such as biological sciences (cell/tissue imaging), materials science (metal grain boundary/semiconductor defect detection)Flat field correction across the entire field of view, eliminating edge blurringMultimodal compatibility, with brightfield as the basis to expand analysis dimensionsHigh-precision aberration correction and optimization of optical performanceSerialized design, covering all scenario requirements
Plan Fluor Series Objectives
Widely used in dynamic fluorescence imaging of living cells, multicolor fluorescence diagnosis of pathological sections, deep imaging of 3D biological structuresSemi-apochromatic correction, balancing resolution and color reproductionWide-spectrum and high light transmittance, suitable for multiple fluorescent dyesMultimodal seamless switching, optimizing experimental proceduresBalanced NA and working distance, suitable for complex biological samplesFull-field flat-field imaging, ensuring the reliability of quantitative analysis
Plan Fluor Ph Series Objectives
Widely used in multimodal dynamic research of living cells, cell function and toxicity analysis, fine observation of transparent/thin samples, imaging of samples in plastic containersMultimodal integration, reducing photobleachingHigh quality and efficiency in fluorescent imagingOutstanding details in phase contrast observationWide sample compatibility
Plan Apo Series Objectives
Widely used in basic life science research, medical research and drug development, cutting-edge technologies and interdisciplinary applicationsExtreme chromatic aberration correction (apochromatic)High flatness across the entire field of view (flat-field design)Infinite correction optical systemBalance between high NA and working distanceCompatibility with multimodal and cutting-edge technologies
