L Plan Fluor EPI Series Objectives

It balances a long working distance with high resolution. A 10.4mm working distance reserves operational space, while a 0.55μm resolution enables submicron-level observation. The flat-field semi-apochromatic design ensures clear imaging across the entire field of view and accurate color reproduction.

Applications include:
Scenarios requiring "operational space + precise observation" such as metal grain statistics and inspection of cold solder joints in chip welding points.