LCD Plan Apo NUV Series Objectives

Field flattening design eliminates field curvature, and a 20mm long working distance avoids collisions with protrusions; achromatic correction covers ultraviolet (355nm) + visible light, resulting in imaging without color fringing.

Applications:
Liquid crystal research and development stage: ultra-thin sample testing (such as experimental glassless substrates); surface defect detection of transparent films (such as OCA glue), or observation of semiconductor wafer dies (extended scenarios).