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LCD Plan Apo NUV Series Objectives

Part Number: VL Plan Apo NUV 50X (t0)

High NA + apochromatic correction enables fine ultraviolet-visible imaging, and flat-field design eliminates high-magnification edge blurring, making it suitable for research-grade analysis.


Applications include:
Liquid crystal micron-level defect analysis (such as 0.5μm scratches, bubbles);
Near-ultraviolet photoresist observation of semiconductor wafers (optimized for 355nm wavelength, compatible with lithography processes).

Images are for display purposes only.

Specifications

NAWD±D.FΦ24 Eyepiece Field of View
0.4515mm1.4um0.48mm
Unit Price
Total
Ship Date
TBD
Quantity Price(USD)Ship Date
1-10TBD
10-TBD
NOTE : Ship Dates above are subject to change depending upon availability.
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