Plan Fluor EPI BD Series Objectives

High-power extreme resolution (close to the diffraction limit), flat-field design to offset field curvature, semi-apochromatic to ensure color accuracy, and 45mm parfocal length for operational safety.

Applications include:
Detection of nanodefects in semiconductor chips (circuit gaps, nanoscratches), microscopic observation of ultra-precision materials (graphene), and high-power dark-field particle analysis.