M Plan Apo NIR HR Series Objectives

NA = 0.75 + HR design, with a resolution of 0.37μm breaking through the near-infrared limit, presenting semiconductor nanostructures and near-infrared labeling of viruses; a short distance of 4mm is used to achieve high NA, suitable for ultra-fine observation of ultra-thin window sheets and quantum device chips.

Applications include:

Graphene wrinkle analysis, virus NIR morphology observation, and semiconductor nanowire array detection.