M Plan Apo NUV Series Objectives

The 20X model with a 17mm working distance, which is better than the conventional 20× (generally < 10mm), is suitable for observing medium details such as chip pins and circuit line widths, balancing magnification and operating space. The 355nm ultraviolet light captures details of photoresist, and the 532nm visible light restores the color of metal circuits, supporting dual-band quality inspection for semiconductor lithography/etching.

Applications:
Semiconductor circuit line width measurement (≥0.7μm), LCD color filter defect detection.