M Plan Apo FN40 Series Objectives

Nanoscale detail reproduction, NA=0.42 + apochromatism, achieving 0.7μm resolution (close to the diffraction limit at 550nm wavelength); flat-field design ensures clarity across the entire range of small fields of view.

Applications:
Semiconductor chip defects, fine analysis of metal microstructures. The long working distance is compatible with thin samples + microhardness tester indenters, balancing high-magnification observation and operational safety.