Plan Apo EPI Series Objectives

It adopts apochromatic correction (achromatism in the entire visible light range of 400–700nm) and flat-field design to eliminate field curvature and color fringing interference. At 50× magnification, it balances resolution and field of view, making it suitable for fine observation at medium magnification.

Applications:
Defect detection of semiconductor chip solder joints (balancing field of view and resolution), analysis of metal grain distribution, and observation of wear at medium magnification for precision molds.