Plan Apo EPI Series Objectives

Apochromatic correction + flat-field design ensures consistent sharpness between the edge and center of the entire field of view (0.25mm), maintaining a high resolution of 0.29μm even at 100× high magnification, making it suitable for nanoscale structure observation.

Applications:
Nanoscale scratch/short circuit detection of chips, microtopography analysis of nanomaterials such as graphene, ultra-high magnification detailed research on metal grain boundaries.