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Plan Apo EPI Series Objectives
Widely used in semiconductor manufacturing and quality inspection, electronic component and MEMS testing, metal material analysis, precision molds and mechanical parts
- Apochromatic correction
- Flat field design
- 95mm infinite conjugate parfocal architecture
- High resolution and long working distance
- EPI episcopic bright field optimization
Overview
Introduction:
- 45mm parfocal long working distance objective lens
- 400 - 700nm achromatic
- Flat field across the entire field of view (field curvature correction)
- Supports coaxial observation
Serivce & Support
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